The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
May. 27, 2008
Chia-wei Huang, Kao-Hsiung, TW;
Te-hung Wu, Tainan County, TW;
Pei-ru Tsai, Tainan County, TW;
Ping-i Hsieh, Tainan County, TW;
Chia-Wei Huang, Kao-Hsiung, TW;
Te-Hung Wu, Tainan County, TW;
Pei-Ru Tsai, Tainan County, TW;
Ping-I Hsieh, Tainan County, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A method for amending layout patterns is disclosed. First, a layout pattern after an optical proximity correction is provided, which is called an amended pattern. Later, a positive sizing procedure and a negative sizing procedure are respectively performed on the amended pattern to respectively obtain a positive sizing pattern and a negative sizing pattern. Then, the positive sizing pattern and the negative sizing pattern are respectively verified to know whether they are useable. Afterwards, the useable positive sizing pattern and the negative sizing pattern are output for the manufacture of a reticle when they are verified to be useable.