Company Filing History:

12 out of 39,228

Fujitsu Corporation

patents

1 out of 79

Tokyo Electron Kabushiki Kaisha

patents

1 out of 17

Semiconductor Leading Edge Technologies, Inc.

patents

4. 1 out of 467

Fujitsu Microelectronics Limited

patents

where one patent can have more than one assignee

Years Active: 1989-2009

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14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7563729 - Method of forming a dielectric film (2009-07-21),

2. 7279790 - Semiconductor device and a manufacturing method thereof (2007-10-09),

3. 7166516 - Method for fabricating a semiconductor device including the use of a compound containing silicon and nitrogen to form an insulation film of SiN or SiCN (2007-01-23),

4. 6998303 - [object Object] (2006-02-14),

5. 6805138 - Semiconductor device production method and semiconductor device production apparatus (2004-10-19),

6. 6664179 - Semiconductor device production method and semiconductor device production apparatus (2003-12-16),

7. 6355545 - Method and apparatus for wiring, wire, and integrated circuit (2002-03-12),

8. 5522412 - Vacuum treatment apparatus and a cleaning method therefor (1996-06-04),

9. 5393565 - Method for deposition of a refractory metal nitride and method for (1995-02-28),

10. 5264038 - Chemical vapor deposition system (1993-11-23),

11. 5232872 - Method for manufacturing semiconductor device (1993-08-03),

12. 5066612 - Method of forming wiring of a semiconductor device (1991-11-19),

13. 4902645 - Method of selectively forming a silicon-containing metal layer (1990-02-20),

14. 4804560 - Method of selectively depositing tungsten upon a semiconductor substrate (1989-02-14),

Title: Takayuki Ohba: Innovator in Semiconductor Technology

Introduction

Takayuki Ohba is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His innovative work has paved the way for advancements in electronic devices and manufacturing processes.

Latest Patents

Among his latest patents, one notable invention is a method of forming a dielectric film. This method involves forming the dielectric film on a substrate surface in multiple steps, with each step occurring in an ambient primarily of nitrogen. Another significant patent is related to a semiconductor device and its manufacturing method. This invention features a multilayer interconnection structure that enhances semiconductor operation speed by utilizing copper wiring, while preventing electro migration through the inclusion of a via plug made from a high melting-point metal, such as tungsten.

Career Highlights

Throughout his career, Takayuki Ohba has worked with leading companies in the technology sector, including Fujitsu Corporation and Tokyo Electron. His expertise in semiconductor technology has been instrumental in developing cutting-edge solutions that address industry challenges.

Collaborations

Takayuki has collaborated with notable professionals in his field, including Toshiya Suzuki and Fumitake Mieno. These collaborations have further enriched his work and contributed to the success of various projects.

Conclusion

Takayuki Ohba's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods and dedication to advancing technology continue to impact the industry positively.

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