Yokohama, Japan

Takashi Hiroi

USPTO Granted Patents = 83 

Average Co-Inventor Count = 5.7

ph-index = 20

Forward Citations = 1,250(Granted Patents)

Forward Citations (Not Self Cited) = 1,195(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Kanagawa, JP (1992)
  • Yokahama, JP (2002)
  • Yokohama, JP (1987 - 2015)
  • Tokyo, JP (2003 - 2024)

Company Filing History:


Years Active: 1987-2024

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Areas of Expertise:
Defect Inspection
Pattern Inspection
Circuit Pattern Examination
Electron Beam Inspection
Charged Particle Beam Device
Integrated Circuit Inspection
Wafer Inspection Tool
Image Processing Unit
Semiconductor Manufacturing
Inspection Information Generation
Pattern Defect Classification
Surface Height Calculation
83 patents (USPTO):Explore Patents

Title: **Takashi Hiroi: An Innovator in Defect Inspection Technology**

Introduction

Takashi Hiroi, located in Yokohama, Japan, is a notable inventor in the field of defect inspection technology. With an impressive portfolio of 83 patents, Hiroi has significantly contributed to advancements in precision inspection systems, particularly in semiconductor manufacturing.

Latest Patents

Hiroi's recent inventions focus on enhancing defect detection methodologies. His latest patents include a "Defect Inspection Apparatus" and a "Defect Inspection Program." The aim of the defect inspection apparatus is to increase defect position precision and facilitate easy alignment of coordinate origin offsets, even in situations where design data is unavailable or challenging to utilize. This apparatus captures essential wafer swath images to detect defects and compute positional deviations. By comparing template patterns from selected swath images with multiple images of the wafer, it calculates positional deviation amounts, enabling precise defect corrections. Additionally, the defect inspection device aims to identify defect candidate positions with greater accuracy by employing reference patterns and correcting position errors across swath images, ultimately refining the defect detection process.

Career Highlights

Hiroi's career features pivotal roles in reputable organizations such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His expertise in engineering and innovation has been instrumental in the development of advanced defect inspection solutions that benefit companies in the semiconductor industry.

Collaborations

Throughout his career, Hiroi has collaborated with talented professionals, including Maki Tanaka and Masahiro Watanabe. These collaborations have further enriched the innovation process, resulting in the creation of cutting-edge technologies that address defects in semiconductor manufacturing.

Conclusion

Takashi Hiroi continues to be a driving force in the realm of defect inspection technology. His contributions, underscored by a substantial number of patents, highlight his commitment to innovation and excellence in the industry. With ongoing advancements in defect detection methods, Hiroi's work is poised to influence the future of semiconductor manufacturing and beyond.

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