The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
Jul. 19, 2006
Takashi Hiroi, Yokohama, JP;
Naoki Hosoya, Tokyo, JP;
Hirohito Okuda, Yokohama, JP;
Koichi Hayakawa, Hitachinaka, JP;
Fumihiko Fukunaga, Hitachinaka, JP;
Takashi Hiroi, Yokohama, JP;
Naoki Hosoya, Tokyo, JP;
Hirohito Okuda, Yokohama, JP;
Koichi Hayakawa, Hitachinaka, JP;
Fumihiko Fukunaga, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention relates to a defect inspection apparatus for inspecting defects in patterns formed on a semiconductor device, on the GUI of which for the confirmation of the inspection results an area is provided for displaying any one of or facing each other the features amount of defects, and the image during inspection or the reacquired image, and on the GUI of which a means is provided for setting the classification class and importance of the defects, and based on the classification class and the importance of the defects information set by this setting means, the classification conditions or the defect judging conditions are automatically or manually set so that the inspection conditions may be set easily.