The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2018
Filed:
Oct. 11, 2013
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Tsuyoshi Minakawa, Tokyo, JP;
Takashi Hiroi, Tokyo, JP;
Takeyuki Yoshida, Tokyo, JP;
Taku Ninomiya, Tokyo, JP;
Takuma Yamamoto, Tokyo, JP;
Hiroyuki Shindo, Tokyo, JP;
Fumihiko Fukunaga, Tokyo, JP;
Yasutaka Toyoda, Tokyo, JP;
Shinichi Shinoda, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Provided is a pattern inspecting and measuring device that decreases the influence of noise and the like and increases the reliability of an inspection or measurement result during inspection or measurement using the position of an edge extracted from image data obtained by imaging a pattern as the object of inspection or measurement. For this purpose, in the pattern inspecting and measuring device in which inspection or measurement of an inspection or measurement object pattern is performed using the position of the edge extracted, with the use of an edge extraction parameter, from the image data obtained by imaging the inspection or measurement object pattern, the edge extraction parameter is generated using a reference pattern having a shape as an inspection or measurement reference and the image data.