Hitachinaka, Japan

Taku Ninomiya

USPTO Granted Patents = 24 

Average Co-Inventor Count = 5.1

ph-index = 9

Forward Citations = 320(Granted Patents)


Location History:

  • Katsuta, JP (1995)
  • Hitachinaka, JP (2001 - 2015)
  • Tokyo, JP (2015 - 2020)

Company Filing History:


Years Active: 1995-2020

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24 patents (USPTO):Explore Patents

Title: **Taku Ninomiya: A Pioneer in Pattern Measurement Technologies**

Introduction

Taku Ninomiya, an influential inventor based in Hitachinaka, Japan, holds an impressive portfolio with 24 patents to his name. His work primarily focuses on advancements in measurement systems and pattern inspection technologies, contributing significantly to the fields of electronics and materials science.

Latest Patents

Among his latest innovations is a system and method for measuring patterns. This cutting-edge pattern measuring device is designed to ensure highly accurate measurement of depth and three-dimensional shapes, regardless of the formation accuracy of deep trenches or holes. The system detects backscattered electrons from patterns generated by irradiation, compares the intensities of signals from various surfaces, and calculates the three-dimensional shape of sidewalls based on differences in heights. This innovative approach not only enhances measurement accuracy but also allows for corrections based on comparisons with estimated shapes, ensuring reliability in the results.

Another noteworthy patent is a pattern inspecting and measuring device that mitigates noise influence, thus increasing the reliability of inspection or measurement results. Utilizing edge extraction parameters generated from reference patterns, this device conducts precise inspections of patterns by analyzing image data obtained through imaging. Such technological advancements highlight Ninomiya’s commitment to improving measurement precision and reliability in electronic and material applications.

Career Highlights

Taku Ninomiya has had a distinguished career, with significant contributions to renowned companies like Hitachi, Ltd. and Hitachi High-Technologies Corporation. His work has notably advanced the capabilities of measurement and inspection technologies, making substantial impacts in various industrial applications.

Collaborations

Throughout his career, Ninomiya has collaborated with esteemed colleagues, including Hiroyuki Shinada and Takashi Hiroi. These partnerships have fostered creativity and innovation, further enhancing the quality and scope of his inventions.

Conclusion

Taku Ninomiya’s remarkable journey as an inventor reflects his dedication to technological advancements in measurement systems and pattern inspection. With a robust patent portfolio, his contributions continue to influence the industry, setting new standards for precision and reliability in measurement technologies. As advancements in these fields progress, Ninomiya's work remains significant in paving the way for future innovations.

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