The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Sep. 26, 2005
Yasuhiro Gunji, Hitachiota, JP;
Taku Ninomiya, Hitachinaka, JP;
Ryuichi Funatsu, Hitachinaka, JP;
Yoshikazu Inada, Hitachinaka, JP;
Kenjirou Yamamoto, Matsudo, JP;
Mari Nozoe, Hino, JP;
Yasuhiro Gunji, Hitachiota, JP;
Taku Ninomiya, Hitachinaka, JP;
Ryuichi Funatsu, Hitachinaka, JP;
Yoshikazu Inada, Hitachinaka, JP;
Kenjirou Yamamoto, Matsudo, JP;
Mari Nozoe, Hino, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.