The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Apr. 02, 2003
Hiroyuki Shinada, Chofu, JP;
Atsuko Takafuji, Tokyo, JP;
Takanori Ninomiya, Hiratsuka, JP;
Yuko Sasaki, Hitachinaka, JP;
Mari Nozoe, Hino, JP;
Hisaya Murakoshi, Tokyo, JP;
Taku Ninomiya, Hitachinaka, JP;
Yuji Kasai, Hitachinaka, JP;
Hiroshi Makino, Kokubunji, JP;
Yutaka Kaneko, Mitaka, JP;
Kenji Tanimoto, Hitachinaka, JP;
Hiroyuki Shinada, Chofu, JP;
Atsuko Takafuji, Tokyo, JP;
Takanori Ninomiya, Hiratsuka, JP;
Yuko Sasaki, Hitachinaka, JP;
Mari Nozoe, Hino, JP;
Hisaya Murakoshi, Tokyo, JP;
Taku Ninomiya, Hitachinaka, JP;
Yuji Kasai, Hitachinaka, JP;
Hiroshi Makino, Kokubunji, JP;
Yutaka Kaneko, Mitaka, JP;
Kenji Tanimoto, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A circuit pattern inspecting instrument includes an electron-optical system for irradiating an electron beam on a sample, an electron beam deflector, a detector for detecting secondary charged particles from the sample, and a mode setting unit for switching between a first mode and a second mode. An electron beam current is larger in the first mode than in the second mode, and an electron beam scanning speed is higher in the first mode than in the second mode. The circuit pattern inspecting instrument is configured so that first the sample is observed in the first mode, then a particular position on the sample is selected based on image data produced by an output of the detector in the first mode, and then the particular position on the sample is observed in the second mode.