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Takanobu Takeda

USPTO Granted Patents = 49

EPO Patents = 16 (Patent Applications = 2)

Average Co-Inventor Count = 3.4

ph-index = 11

Forward Citations = 425(Granted Patents)

Location History:

Kubiki-mura, JP (1998 - 2003)
Nakakubiki-gun, JP (2000 - 2006)
Niigata-ken, JP (1998 - 2007)
Niigata, JP (2005 - 2011)
Jyoetsu, JP (2012)
Annaka, JP (2013 - 2014)
Joetsu, JP (2008 - 2015)

Company Filing History:

48 out of 5,978

Shin-etsu Chemical Co., Ltd.

Shin-etsu Chemical C., Ltd

Years Active: 1998-2015

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Areas of Expertise:

Chemically Amplified Resist

Photocurable Resin Composition

Patterning Process

Positive Resist Composition

Negative Resist Composition

Silicon-Containing Polymer

Epoxy-Containing Polymer

Photomask Preparation

Dendritic Polymers

Adhesive Composition

Polyimide Silicone

Alcoholic Hydroxyl-Containing Compounds

49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9075306 - Chemically amplified negative resist composition and patterning process (2015-07-07),

2. 8889810 - Adhesive composition and adhesive dry film (2014-11-18),

3. 8729148 - Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts (2014-05-20),

4. 8697333 - Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film (2014-04-15),

5. 8481244 - Epoxy-containing polymer, photo-curable resin composition, patterning process, and electric/electronic part protective film (2013-07-09),

6. 8476379 - Silphenylene skeleton-containing silicone type polymer and method for manufacturing the same (2013-07-02),

7. 8378148 - Alcoholic hydroxyl-containing compounds and making method (2013-02-19),

8. 8367295 - Preparation process of chemically amplified resist composition (2013-02-05),

9. 8343694 - Photomask blank, resist pattern forming process, and photomask preparation process (2013-01-01),

10. 8263308 - Polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation (2012-09-11),

11. 8252518 - Chemically amplified positive resist composition and resist patterning process (2012-08-28),

12. 8202677 - Chemically-amplified positive resist composition and patterning process thereof (2012-06-19),

13. 8193307 - Synthesis of photoresist polymer (2012-06-05),

14. 8110335 - Resist patterning process and manufacturing photo mask (2012-02-07),

15. 7977027 - Resist composition and patterning process (2011-07-12),

Title: The Innovative Journey of Takanobu Takeda

Introduction: Takanobu Takeda, a visionary inventor hailing from Joetsu, Japan, has made significant contributions to the world of innovations with his groundbreaking ideas and inventions.

Latest Patents: Takanobu Takeda holds several patents in various fields, including technology, engineering, and healthcare, showcasing his diverse range of expertise and creativity.

Career Highlights: Throughout his illustrious career, Takanobu Takeda has been recognized for his pioneering work in developing cutting-edge solutions that have revolutionized industries and improved the quality of life for many.

Collaborations: Takanobu Takeda has collaborated with leading research institutions, universities, and companies worldwide, fostering a culture of innovation and knowledge sharing to drive progress and advancements in the field of inventions.

Conclusion: Takanobu Takeda's relentless pursuit of innovation and his passion for creating impactful inventions have solidified his reputation as a trailblazer in the world of inventors, leaving a lasting legacy that will continue to inspire future generations.

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