The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Oct. 22, 2007
Applicants:
Takanobu Takeda, Joetsu, JP;
Osamu Watanabe, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Tamotsu Watanabe, Joetsu, JP;
Inventors:
Takanobu Takeda, Joetsu, JP;
Osamu Watanabe, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Tamotsu Watanabe, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from collapsing after development, and has improved etch resistance.