IDiyas

For the Inventor, By the Inventor

Joetsu, Japan

Ryuji Koitabashi

USPTO Granted Patents = 15 

 

Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 58(Granted Patents)


Location History:

  • Niigata, JP (2005 - 2009)
  • Joetsu, JP (2007 - 2015)
  • Jyoetsu, JP (2012 - 2020)

Company Filing History:

goldMedal15 out of 5,966 
 
Shin-etsu Chemical Co., Ltd.
 patents
silverMedal4 out of 1,268 
 
Toppan Printing Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2005-2020

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15 patents (USPTO):
1. 10768524 - Photomask blank substrate container, method for storing photomask blank substrate and method for transporting photomask blank substrate (2020-09-08),
2. 9091931 - Photomask blank and method for manufacturing photomask (2015-07-28),
3. 9075306 - Chemically amplified negative resist composition and patterning process (2015-07-07),
4. 8858814 - Photomask blank, processing method, and etching method (2014-10-14),
5. 8753787 - Light pattern exposure method, photomask, and photomask blank (2014-06-17),
6. 8753786 - Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank (2014-06-17),
7. 8475978 - Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film (2013-07-02),
8. 8367295 - Preparation process of chemically amplified resist composition (2013-02-05),
9. 8343694 - Photomask blank, resist pattern forming process, and photomask preparation process (2013-01-01),
10. 8110335 - Resist patterning process and manufacturing photo mask (2012-02-07),
11. 7977027 - Resist composition and patterning process (2011-07-12),
12. 7501223 - Polymer, resist composition and patterning process using the same (2009-03-10),
13. 7312016 - Chemically amplified positive resist composition and patterning process (2007-12-25),
14. 7288363 - Chemically amplified positive resist composition and patterning process (2007-10-30),
15. 6861198 - Negative resist material and pattern formation method using the same (2005-03-01),

Title: Ryuji Koitabashi - Innovative Inventor from Joetsu

Introduction: Ryuji Koitabashi is a renowned inventor hailing from Joetsu, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ryuji Koitabashi holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach.

Career Highlights: With over two decades of experience in the industry, Ryuji Koitabashi has worked with leading tech companies to develop cutting-edge solutions that have revolutionized various sectors.

Collaborations: Throughout his career, Ryuji Koitabashi has collaborated with top researchers, engineers, and scientists globally, fostering a culture of innovation and knowledge exchange.

Conclusion: Ryuji Koitabashi's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

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