The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Mar. 26, 2010
Satoshi Watanabe, Joetsu, JP;
Hideo Kaneko, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Shinichi Igarashi, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Shozo Shirai, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Hideo Kaneko, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Shinichi Igarashi, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Shozo Shirai, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A photomask blank is provided comprising a transparent substrate, a single or multi-layer film including an outermost layer composed of chromium base material, and an etching mask film. The etching mask film is a silicon oxide base material film formed of a composition comprising a hydrolytic condensate of a hydrolyzable silane, a crosslink promoter, and an organic solvent and having a thickness of 1-10 nm. The etching mask film has high resistance to chlorine dry etching, ensuring high-accuracy processing of the photomask blank.