Inventors with similar research interests:
Location History:
- Kanagawa, JP (1996)
- Kanagawa-ken, JP (1996 - 1998)
- Kubiki-mura, JP (2003)
- Nakakubiki-gun, JP (2002 - 2007)
- Niigata-ken, JP (2003 - 2010)
- Niigata, JP (2007 - 2017)
- Jyoetsu, JP (2016 - 2017)
- Joetsu, JP (2009 - 2024)
Company Filing History:
64 out of 5,966 
3 out of 1,268 
2 out of 24 Years Active: 1996-2025
Title: Hideo Kaneko: Innovator in EUV Lithography
Introduction: Hideo Kaneko, an accomplished inventor based in Joetsu, Japan, has made significant contributions to the field of lithography, particularly in extreme ultraviolet (EUV) technology. With a remarkable portfolio of 66 patents, Kaneko has positioned himself as a key player in the innovation landscape related to reflective mask technologies.
Latest Patents: Among Hideo Kaneko's latest patents are groundbreaking inventions that focus on reflective masks essential for EUV lithography. One notable patent is the development of a reflective mask blank, which consists of a substrate and a multilayer reflection film that effectively reflects EUV exposure light. This invention includes an absorber film with tungsten and other metals or metalloids, enhancing its functionality in advanced lithography applications. Another significant patent details a substrate with a multilayer reflection film for an EUV mask blank. This patent emphasizes a structure comprising a Si/Mo laminated reflection film and a protective layer made of ruthenium (Ru), enhancing the reliability and performance of EUV mask blinks.
Career Highlights: Hideo Kaneko's career is marked by his role in prestigious companies, including Shin-Etsu Chemical Co., Ltd. and Toppan Printing Co., Ltd. His expertise in the field has driven forward innovations that are critical to developing next-generation lithographic technologies.
Collaborations: Throughout his career, Kaneko has worked alongside notable colleagues such as Yukio Inazuki and Hiroki Yoshikawa. Their combined expertise and innovation have contributed to advancements in EUV lithography, shaping the industry's future.
Conclusion: Hideo Kaneko’s work exemplifies the spirit of innovation in the realm of lithography. His extensive patent portfolio and collaborations highlight his dedication to advancing technology that is essential for the evolving demands of the semiconductor manufacturing industry. His contributions will continue to impact the field for years to come.
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