The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Sep. 25, 2007
Takanobu Takeda, Niigata, JP;
Osamu Watanabe, Niigata, JP;
Satoshi Watanabe, Niigata, JP;
Ryuji Koitabashi, Niigata, JP;
Keiichi Masunaga, Niigata, JP;
Tamotsu Watanabe, Niigata, JP;
Takanobu Takeda, Niigata, JP;
Osamu Watanabe, Niigata, JP;
Satoshi Watanabe, Niigata, JP;
Ryuji Koitabashi, Niigata, JP;
Keiichi Masunaga, Niigata, JP;
Tamotsu Watanabe, Niigata, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to 500,000. There can be provided a polymer, and a resist composition, in particular, a chemically amplified positive resist composition that exhibit higher resolution than conventional positive resist compositions, good in-plane dimension uniformity of developed resist patterns on substrates such as mask blanks and high etching resistance.