The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Sep. 09, 2011
Hiroki Yoshikawa, Joetsu, JP;
Yukio Inazuki, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Hideo Kaneko, Joetsu, JP;
Takashi Haraguchi, Tokyo, JP;
Yosuke Kojima, Tokyo, JP;
Tomohito Hirose, Tokyo, JP;
Hiroki Yoshikawa, Joetsu, JP;
Yukio Inazuki, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Hideo Kaneko, Joetsu, JP;
Takashi Haraguchi, Tokyo, JP;
Yosuke Kojima, Tokyo, JP;
Tomohito Hirose, Tokyo, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
A photomask blank has a film of a transition metal/silicon base material comprising a transition metal, silicon, oxygen and nitrogen, having an oxygen content of at least 3 atom %, and satisfying the formula: 4×C/100−6×C/100>1 wherein Cis a silicon content in atom % and Cis a transition metal content in atom %.