Company Filing History:
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Years Active: 2013-2014
Title: Tomohito Hirose: Innovator in Light Pattern Exposure Technology
Introduction
Tomohito Hirose is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of light pattern exposure technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of photomasks used in various applications.
Latest Patents
Hirose's latest patents include innovative methods and materials for light pattern exposure. One of his notable inventions is a light pattern exposure method that utilizes ArF excimer laser light to irradiate a resist film through a halftone phase shift mask. This mask is designed with a transparent substrate and a halftone phase shift film made from a specific combination of transition metals, silicon, nitrogen, and oxygen. The atomic ratio of these materials is carefully controlled, ensuring optimal performance. Another significant patent involves a similar light pattern exposure method using a photomask, which also comprises a transparent substrate and an optical film made from the same materials, allowing for precise exposure with ArF excimer laser light.
Career Highlights
Throughout his career, Tomohito Hirose has worked with leading companies in the industry, including Shin-Etsu Chemical Co., Ltd. and Toppan Printing Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in photomask production and light pattern exposure methods.
Collaborations
Hirose has collaborated with notable colleagues in his field, including Hiroki Yoshikawa and Yukio Inazuki. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Tomohito Hirose's contributions to light pattern exposure technology have positioned him as a key figure in the field. His innovative patents and collaborations with industry leaders continue to influence advancements in photomask technology.