The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2013
Filed:
Aug. 11, 2011
Ryuji Koitabashi, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Takanobu Takeda, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Tamotsu Watanabe, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Takanobu Takeda, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Tamotsu Watanabe, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity.