The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Apr. 28, 2008
Keiichi Masunaga, Joetsu, JP;
Takanobu Takeda, Joetsu, JP;
Tamotsu Watanabe, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Osamu Watanabe, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Takanobu Takeda, Joetsu, JP;
Tamotsu Watanabe, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Osamu Watanabe, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., , JP;
Abstract
Provided are a preparation method of a resist composition which enables stabilization of a dissolution performance of a resist film obtained from the resist composition thus prepared; and a resist composition obtained by the preparation process and showing small lot-to-lot variations in degradation over time. The process of the present invention is for preparing a chemically amplified resist composition containing a binder, an acid generator, a nitrogenous basic substance and a solvent and it has steps of selecting, as the solvent, a solvent having a peroxide content not greater than an acceptable level, and mixing constituent materials of the resist composition in the selected solvent.