The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Mar. 29, 2011
Takanobu Takeda, Joetsu, JP;
Tamotsu Watanabe, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Akinobu Tanaka, Joetsu, JP;
Osamu Watanabe, Joetsu, JP;
Takanobu Takeda, Joetsu, JP;
Tamotsu Watanabe, Joetsu, JP;
Ryuji Koitabashi, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Akinobu Tanaka, Joetsu, JP;
Osamu Watanabe, Joetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile