The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2014

Filed:

Dec. 14, 2010
Applicants:

Satoshi Asai, Annaka, JP;

Takanobu Takeda, Annaka, JP;

Hideto Kato, Annaka, JP;

Inventors:

Satoshi Asai, Annaka, JP;

Takanobu Takeda, Annaka, JP;

Hideto Kato, Annaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 3/28 (2006.01); C08F 2/50 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03C 1/73 (2006.01); C09D 183/14 (2006.01); H01L 23/29 (2006.01);
U.S. Cl.
CPC ...
C08L 83/09 (2013.01); C09D 183/14 (2013.01); H01L 23/293 (2013.01);
Abstract

Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D): (A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1) wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3) (B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule;(C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and(D) a solvent.


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