Annaka, Japan

Satoshi Asai

This inventor holds 25 USPTO granted patents and 13 EPO patents, primarily in Photo-Curable Resins. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2003-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Asai. Retrieved from https://idiyas.com/inventor/satoshi-asai-qvncqmp1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 84.0

 

Average Co-Inventor Count = 2.7

ph-index = 6

Forward Citations = 78(Granted Patents)


Location History:

  • Gunma-ken, JP (2003 - 2006)
  • Joetsu, JP (2010)
  • Maebashi, JP (2017 - 2019)
  • Annaka, JP (2014 - 2022)

Company Filing History:


Years Active: 2003-2025

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Areas of Expertise:
Photosensitive Resin
Pattern Formation
Semiconductor Apparatus
Chemically Amplified Resist
Photo-Curable Dry Film
Adhesive Composition
Protective Film
Silphenylene-Bearing Polymer
Organosiloxane Polymer
Epoxy Resin
Film Material
Low Molecular Weight Siloxanes
25 patents (USPTO):Explore Patents

Title: Satoshi Asai: Innovator in Photosensitive Materials

Introduction: Satoshi Asai, a prominent inventor based in Annaka, Japan, holds an impressive portfolio of 24 patents. His innovations have significantly contributed to the field of photosensitive materials, which are essential in various applications, including electronics and manufacturing.

Latest Patents: Among his latest patents, Satoshi has developed a remarkable photosensitive resin composition. This composition includes a polymer featuring a silphenylene skeleton and a fluorene skeleton, complete with crosslinkable sites in the molecule. It further incorporates a phenol compound with a molecular weight ranging from 300 to 10,000, a photoacid generator, and a benzotriazole or imidazole compound. The result is enhanced film properties, allowing for the formation of fine size patterns even from thick films. Another notable patent involves a laminate designed for pattern formation that ensures excellent opening shapes, even when utilizing chemically amplified negative type resist materials. This laminate consists of a chemically amplified negative type resist layer complemented by a basic resin coat layer that contains a basic compound up to 10,000 molecular weight.

Career Highlights: Satoshi Asai's career at Shin-Etsu Chemical Co., Ltd. has been marked by continuous innovation and a commitment to advancing technology in materials science. His contributions have positioned his company as a leader in the development of advanced photosensitive materials.

Collaborations: Throughout his career, Satoshi has collaborated with talented individuals, such as Hideto Kato and Kyoko Soga. Their collective efforts have fostered an environment of creativity and innovation, resulting in groundbreaking advancements in their field.

Conclusion: Satoshi Asai exemplifies the spirit of innovation within the technical realm of photosensitive materials. His extensive patent portfolio and collaborations highlight his dedication to pushing the boundaries of technology, offering insights and advancements that benefit various industries. As the demand for sophisticated materials continues to grow, Satoshi Asai's contributions will undoubtedly play an instrumental role in shaping the future of this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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