The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Oct. 13, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/11 (2006.01); G03C 11/12 (2006.01); C08G 77/38 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); C09D 133/08 (2006.01); C09D 133/24 (2006.01); C09D 163/00 (2006.01); C09D 167/00 (2006.01); C09D 175/04 (2006.01); C09D 183/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08G 77/38 (2013.01); G03F 7/0382 (2013.01); G03F 7/11 (2013.01); G03F 7/161 (2013.01); G03F 7/2002 (2013.01); C09D 133/08 (2013.01); C09D 133/24 (2013.01); C09D 163/00 (2013.01); C09D 167/00 (2013.01); C09D 175/04 (2013.01); C09D 183/04 (2013.01);
Abstract
To provide a laminate which enables pattern formation with excellent opening shape even in the case where a chemically amplified negative type resist material is used, and a pattern forming method in which the laminate is used. The laminate includes a chemically amplified negative type resist layer, and a basic resin coat layer thereon that contains 0.001 to 10% by weight of a basic compound having a molecular weight of up to 10,000.