The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2020
Filed:
Apr. 11, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03C 11/12 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); C25D 3/02 (2006.01); G03F 7/32 (2006.01); C08G 8/28 (2006.01); C23C 18/16 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); G03F 7/022 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01); C08G 8/28 (2013.01); C23C 18/1601 (2013.01); C25D 3/02 (2013.01); G03C 11/12 (2013.01); G03F 7/022 (2013.01); G03F 7/023 (2013.01); G03F 7/0236 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract
A laminate comprising a thermoplastic film and a positive resist film is provided, the positive resist film comprising (A) a novolak resin-naphthoquinone diazide (NQD) base resin composition, (B) a polyester, and (C) 3-30 wt % of an organic solvent. The resist film may be transferred to a stepped support without forming voids.