The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2019

Filed:

Feb. 07, 2017
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Kyoko Soga, Annaka, JP;

Satoshi Asai, Maebashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); C08G 77/18 (2006.01); H01L 21/56 (2006.01); H01L 21/78 (2006.01); H01L 23/29 (2006.01); H01L 23/00 (2006.01); H01L 25/065 (2006.01); H01L 25/00 (2006.01); C08L 63/00 (2006.01); C08L 83/14 (2006.01); G03F 7/075 (2006.01); C08G 59/62 (2006.01); C08G 77/52 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08G 59/621 (2013.01); C08G 59/623 (2013.01); C08G 77/18 (2013.01); C08L 63/00 (2013.01); C08L 83/14 (2013.01); G03F 7/0382 (2013.01); G03F 7/0757 (2013.01); H01L 21/563 (2013.01); H01L 21/78 (2013.01); H01L 23/296 (2013.01); H01L 24/13 (2013.01); H01L 24/27 (2013.01); H01L 24/29 (2013.01); H01L 24/73 (2013.01); H01L 24/81 (2013.01); H01L 24/83 (2013.01); H01L 24/92 (2013.01); H01L 24/94 (2013.01); H01L 25/0657 (2013.01); H01L 25/50 (2013.01); C08G 77/52 (2013.01); H01L 24/03 (2013.01); H01L 24/05 (2013.01); H01L 24/11 (2013.01); H01L 24/16 (2013.01); H01L 2224/0345 (2013.01); H01L 2224/0346 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/05147 (2013.01); H01L 2224/05647 (2013.01); H01L 2224/05655 (2013.01); H01L 2224/11002 (2013.01); H01L 2224/1146 (2013.01); H01L 2224/1147 (2013.01); H01L 2224/11334 (2013.01); H01L 2224/11901 (2013.01); H01L 2224/133 (2013.01); H01L 2224/1329 (2013.01); H01L 2224/13082 (2013.01); H01L 2224/13083 (2013.01); H01L 2224/13111 (2013.01); H01L 2224/13116 (2013.01); H01L 2224/13147 (2013.01); H01L 2224/13155 (2013.01); H01L 2224/13291 (2013.01); H01L 2224/13393 (2013.01); H01L 2224/16148 (2013.01); H01L 2224/271 (2013.01); H01L 2224/2741 (2013.01); H01L 2224/27416 (2013.01); H01L 2224/27422 (2013.01); H01L 2224/27436 (2013.01); H01L 2224/27618 (2013.01); H01L 2224/27848 (2013.01); H01L 2224/29011 (2013.01); H01L 2224/2919 (2013.01); H01L 2224/73104 (2013.01); H01L 2224/73204 (2013.01); H01L 2224/8114 (2013.01); H01L 2224/81191 (2013.01); H01L 2224/81193 (2013.01); H01L 2224/81203 (2013.01); H01L 2224/81204 (2013.01); H01L 2224/81815 (2013.01); H01L 2224/81986 (2013.01); H01L 2224/83048 (2013.01); H01L 2224/83075 (2013.01); H01L 2224/83191 (2013.01); H01L 2224/83192 (2013.01); H01L 2224/83193 (2013.01); H01L 2224/83203 (2013.01); H01L 2224/83204 (2013.01); H01L 2224/83862 (2013.01); H01L 2224/83986 (2013.01); H01L 2224/9211 (2013.01); H01L 2224/92125 (2013.01); H01L 2224/92143 (2013.01); H01L 2224/94 (2013.01); H01L 2225/06513 (2013.01); H01L 2225/06565 (2013.01); H01L 2225/06568 (2013.01); H01L 2924/00015 (2013.01); H01L 2924/3511 (2013.01); H01L 2924/381 (2013.01); H01L 2924/3841 (2013.01);
Abstract

A method for manufacturing a semiconductor apparatus, including preparing a first substrate provided with a pad optionally having a plug and a second substrate or device provided with a plug, forming a solder ball on at least one of the pad or plug of first substrate and the plug of second substrate or device, covering at least one of a pad-forming surface of first substrate and a plug-forming surface of second substrate or device with a photosensitive insulating layer, forming an opening on the pad or plug of the substrate or device that has been covered with photosensitive insulating layer by lithography, pressure-bonding the second substrate or device's plug to the pad or plug of first substrate with the solder ball through the opening, electrically connecting pad or plug of first substrate to second substrate or device's plug by baking, and curing photosensitive insulating layer by baking.


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