Steffen K Kaldor

Title: Steffen K Kaldor - Innovator in Integrated Circuit Technology

Introduction

Steffen K Kaldor is a notable inventor based in Fishkill, NY, who has made significant contributions to the field of integrated circuit technology. With a total of 11 patents to his name, Kaldor’s work focuses on enhancing the performance and reliability of interconnect structures in integrated circuits.

Latest Patents

Kaldor’s latest inventions include:

1. **Back end interconnect with a shaped interface** - This innovative interconnect structure forms contacts between successive layers by removing material in a cone-shaped aperture, thereby increasing the mechanical strength of the contact and enhancing overall circuit reliability.

2. **Method of forming an interconnect structure diffusion barrier with high nitrogen content** - In this invention, a diffusion barrier film is formed in a damascene structure using a film with a composition of TaN, ensuring improved durability in integrated circuits.

Career Highlights

Steffen K Kaldor has worked with prominent organizations such as International Business Machines Corporation (IBM) and Infineon Technologies AG. His extensive experience in the semiconductor industry has facilitated his innovative approaches to circuit design and manufacturing.

Collaborations

Throughout his career, Kaldor has collaborated with several accomplished professionals, including Timothy Joseph Dalton and Kaushik Arun Kumar. These collaborations have likely contributed to his successful patent applications and advancements in circuit technology.

Conclusion

Steffen K Kaldor exemplifies the spirit of innovation in the realm of integrated circuits. His patents reflect a commitment to improving the reliability and functionality of electronic devices, making him a valuable contributor to the technology sector.