The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Nov. 21, 2003
Applicants:
Cyril Cabral, Jr., Ossining, NY (US);
Steffen K. Kaldor, Fishkill, NY (US);
Hyungjun Kim, Lagrangeville, NY (US);
Stephen M. Rossnagel, Pleasantville, NY (US);
Inventors:
Cyril Cabral, Jr., Ossining, NY (US);
Steffen K. Kaldor, Fishkill, NY (US);
Hyungjun Kim, Lagrangeville, NY (US);
Stephen M. Rossnagel, Pleasantville, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/52 (2006.01); H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
Abstract
In an interconnect structure of an integrated circuit, a diffusion barrier film in a damascene structure is formed of a film having the composition TaN, where x is greater than 1.2 and with a thickness of 0.5 to 5 nm.