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Shingo Hishiya

USPTO Granted Patents = 24 (Patent Applications = 2)

Average Co-Inventor Count = 3.3

ph-index = 5

Forward Citations = 51(Granted Patents)

Location History:

Tokyo, JP (2007 - 2012)
Nirasaki, JP (2004 - 2023)
Yamanashi, JP (2024)

Company Filing History:

24 out of 10,326

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2004-2025

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24 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12438055 - Abnormality detection method and processing apparatus (2025-10-07),

2. 12334380 - Boat transfer method and heat treatment apparatus (2025-06-17),

3. 12018366 - Substrate processing apparatus and cleaning method (2024-06-25),

4. 11786946 - Cleaning method and film forming apparatus (2023-10-17),

5. 11725281 - Gas introduction structure, thermal processing apparatus and gas supply method (2023-08-15),

6. 10968515 - Vertical heat treatment apparatus (2021-04-06),

7. 10964530 - Method of forming blocking silicon oxide film, and storage medium (2021-03-30),

8. 10553686 - Method and apparatus for forming silicon oxide film, and storage medium (2020-02-04),

9. 9776202 - Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatus (2017-10-03),

10. 9562285 - Film forming method, film forming apparatus and storage medium (2017-02-07),

11. 8896097 - Method of manufacturing capacitor, capacitor and method of forming dielectric film for use in capacitor (2014-11-25),

12. 8815112 - Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus (2014-08-26),

13. 8735304 - Film forming method, film forming apparatus, and storage medium (2014-05-27),

14. 8642127 - Method of forming titanium nitride film (2014-02-04),

15. 8389421 - Film formation method and film formation apparatus (2013-03-05),

Title: Shingo Hishiya: Pioneering Innovator Shaping the Future of Technology

Introduction: Shingo Hishiya, a visionary inventor hailing from Nirasaki, JP, has made significant contributions to the field of technology with his relentless pursuit of excellence and passion for innovation. With 21 patents under his belt, his groundbreaking work continues to inspire generations of inventors around the world.

Latest Patents:

1. Cleaning Method and Film Forming Apparatus: Hishiya's method revolutionizes the cleaning process of film forming apparatus by efficiently removing unwanted films and restoring the surface state to its original condition.

2. Gas Introduction Structure, Thermal Processing Apparatus, and Gas Supply Method: His innovative gas introduction structure optimizes the supply of processing gas into processing containers, enhancing thermal processing efficiency.

Career Highlights: Throughout his illustrious career, Shingo Hishiya has worked with renowned companies such as Tokyo Electron Limited and Elpida Memory, Inc. His expertise and groundbreaking inventions have earned him recognition as a pioneer in the technology industry.

Collaborations: Hishiya has had the privilege of collaborating with talented individuals such as Yuichiro Morozumi and Katsushige Harada, further expanding the scope of his innovative projects and pushing the boundaries of technological advancements.

Conclusion: Shingo Hishiya's remarkable journey as an inventor showcases his unwavering commitment to innovation and excellence. His impactful inventions and collaborations not only shape the future of technology but also serve as a shining example for aspiring inventors worldwide.

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