The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Dec. 18, 2018
Tokyo Electron Limited, Tokyo, JP;
Eiji Kikama, Nirasaki, JP;
Hiromi Shima, Nirasaki, JP;
Kyungseok Ko, Gyeonggi-do, KR;
Shingo Hishiya, Nirasaki, JP;
Keisuke Suzuki, Nirasaki, JP;
Tosihiko Jo, Nirasaki, JP;
Ken Itabashi, Nirasaki, JP;
Satoru Ogawa, Iwate, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a vertical heat treatment apparatus for forming a film by supplying a precursor gas to a plurality of substrates that are held in a substantially horizontal posture on a substrate holder with a predetermined interval in a vertical direction. The apparatus includes a processing container including an inner tube accommodating the substrate holder and an outer tube that is disposed outside the inner tube; and a gas nozzle that extends vertically along an inner peripheral surface of the inner tube and has a distal end that penetrates from an inside of the inner tube to an outside of the inner tube. A first gas hole for supplying the precursor gas to the inside of the inner tube and a second gas hole for supplying the precursor gas to the outside of the inner tube are formed on the gas nozzle.