Satoru Ogawa

Title: Satoru Ogawa: Innovator in Substrate Processing Technologies

Introduction

Satoru Ogawa is a prominent inventor based in Iwate, Japan. He has made significant contributions to the field of substrate processing, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of gas supply systems in processing containers.

Latest Patents

Ogawa's latest patents include innovative designs such as a gas nozzle and a gas introduction structure. The gas nozzle features a unique design that extends vertically inward of the inner wall of a processing container. It includes a plurality of first gas holes arranged at intervals in a longitudinal direction, along with a second gas hole at the tip, which is oriented to optimize gas flow. His gas introduction structure is designed for supplying processing gas into a vertically elongated processing container, incorporating a processing gas supply pipe with multiple gas discharge holes. This design allows for the introduction of a dilution gas to enhance processing efficiency.

Career Highlights

Satoru Ogawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has positioned him as a key player in the development of advanced substrate processing technologies.

Collaborations

Ogawa has collaborated with notable coworkers such as Shingo Hishiya and Kuniyasu Sakashita. Their combined expertise has contributed to the successful development of innovative technologies in their field.

Conclusion

Satoru Ogawa's contributions to substrate processing technologies through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the efficiency of processing systems in semiconductor manufacturing.