The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Sep. 01, 2011
Tsuyoshi Mizuno, Koshi, JP;
Hiromitsu Namba, Koshi, JP;
Yuichiro Morozumi, Nirasaki, JP;
Shingo Hishiya, Nirasaki, JP;
Katsushige Harada, Nirasaki, JP;
Fumiaki Hayase, Nirasaki, JP;
Tsuyoshi Mizuno, Koshi, JP;
Hiromitsu Namba, Koshi, JP;
Yuichiro Morozumi, Nirasaki, JP;
Shingo Hishiya, Nirasaki, JP;
Katsushige Harada, Nirasaki, JP;
Fumiaki Hayase, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed is a method for processing a substrate including a first process and a second process. The first process comprises supporting the substrate formed with a titanium-containing film on its front surface and rear surface by a support unit which is rotatably installed; rotating the substrate along with the support unit; and supplying a first processing liquid containing hydrofluoric acid to the rear surface of the substrate thereby processing the rear surface of the substrate with the first processing liquid. The second process comprises supplying a second processing liquid containing ammonia hydrogen peroxide mixture to the rear surface of the substrate after the first process is completed, thereby processing the rear surface of the substrate with the second processing liquid.