Location History:
- Narasaki, JP (2013)
- Nirasaki, JP (2010 - 2015)
- Kurokawa-gun, JP (2015)
- Auderghem, BE (2019)
- Yamanashi, JP (2011 - 2020)
- Miyagi, JP (2015 - 2024)
Company Filing History:
36 out of 10,326 
3 out of 38 
2 out of 557 
Years Active: 2010-2025
Title: Innovative Contributions of Shigeru Tahara
Introduction
Shigeru Tahara, a prominent inventor based in Miyagi, Japan, has made significant advancements in the field of plasma processing technologies. With an impressive portfolio of 36 patents, he has played a pivotal role in developing methods that enhance substrate processing in various technological applications.
Latest Patents
Tahara's latest patents showcase his expertise in selective etching and plasma processing. One notable patent is for a method of selective etching using fluorine, oxygen, and noble gas-containing plasmas. This innovative approach involves loading the substrate into a plasma processing chamber and performing a cyclic plasma etch process. Each cycle includes generating a first plasma from a gas mixture consisting of fluorosilane and oxygen, followed by forming a passivation film, and generating a second plasma from a noble gas to perform an etch step.
Another significant patent pertains to etching oxide semiconductor films. This method includes providing a substrate with a silicon-containing mask on an oxide semiconductor film that contains indium, gallium, and zinc. By supplying a processing gas with bromine or iodine, Tahara's patented method effectively etches the oxide semiconductor film through plasma generated from the processing gas.
Career Highlights
Throughout his career, Shigeru Tahara has made remarkable contributions while working with notable companies such as Tokyo Electron Limited and Imec. His work has significantly impacted the semiconductor industry, particularly in the development of advanced processing techniques that enhance the efficiency and effectiveness of devices.
Collaborations
Tahara has collaborated with esteemed professionals in the field, including Eiichi Nishimura and Akira Koshiishi. These partnerships have further enriched his research and development efforts, leading to innovative breakthroughs in plasma processing technologies.
Conclusion
In conclusion, Shigeru Tahara stands out as a prolific inventor whose contributions have significantly shaped the landscape of plasma processing in semiconductor technology. His 36 patents reflect a continuous commitment to innovation, demonstrating his critical role in advancing the capabilities of modern manufacturing processes.