Shen-Yang Lee

Title: Innovations of Shen-Yang Lee in Semiconductor Technology

Introduction

Shen-Yang Lee is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly with his innovative designs and methods.

Latest Patents

Shen-Yang Lee holds a patent for a semiconductor device with tunable threshold voltage and a method for manufacturing the same. This semiconductor device includes a channel layer, an interfacial layer, a gate dielectric layer, a gate electrode, dipole elements, and additional elements. The interfacial layer is disposed on the channel layer and includes an insulating material. The gate dielectric layer is positioned over the interfacial layer, ensuring that the channel layer is separated from the gate dielectric layer by the interfacial layer. The gate electrode is placed on the gate dielectric layer. The dipole elements are present in at least one of the interfacial layer and the gate dielectric layer in a predetermined amount, allowing the semiconductor device to achieve a predetermined threshold voltage. The additional elements are strategically located in regions where the dipole elements are present to reduce interfacial defects caused by the dipole elements, and these additional elements differ from the dipole elements. Methods for manufacturing the semiconductor device are also disclosed in the patent.

Career Highlights

Shen-Yang Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing semiconductor technologies and improving device performance.

Collaborations

Shen-Yang Lee has collaborated with notable colleagues, including Chansyun David Yang and Huang-Lin Chao, contributing to various projects and innovations in semiconductor technology.

Conclusion

Shen-Yang Lee's contributions to semiconductor technology, particularly through his patented innovations, highlight his role as a significant inventor in the field. His work continues to influence advancements in semiconductor devices and manufacturing methods.