Santa Clara, CA, United States of America

Seon-Mee Cho

This inventor holds 32 USPTO granted patents and 8 published patent applications, primarily in Thin Film Deposition. Top assignees: Applied Materials, Inc., Novellus Systems Incorporated, Intermolecular, Inc.. Active years: 2002-2018.

USPTO Granted Patents = 32 

% Patents Active = 40.6

Average Co-Inventor Count = 4.4

ph-index = 12

Forward Citations = 2,257(Granted Patents)


Location History:

  • Beaverton, OR (US) (2007 - 2009)
  • San Jose, CA (US) (2007 - 2011)
  • Santa Clara, CA (US) (2002 - 2018)

Company Filing History:


Years Active: 2002-2018

Loading Chart...
Areas of Expertise:
Thin Film Deposition
Plasma Immersion Ion Implantation
Mechanical Strength Enhancement
Dielectric Films
Silicon Carbide
IGZO Growth
Microwave Plasma
Optical Emission Spectroscopy
CVD Processes
Low-K Dielectric
Pulsed Deposition
UV Treatment
32 patents (USPTO):Explore Patents

Title: The Innovative Journey of Seon-Mee Cho

Introduction: Seon-Mee Cho, a talented inventor based in Santa Clara, CA, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Seon-Mee Cho's latest patents include a cutting-edge software application for enhancing cybersecurity measures in cloud computing systems and a revolutionary algorithm for optimizing data storage in large-scale networks.

Career Highlights: With a career spanning over two decades, Seon-Mee Cho has worked for several leading tech companies, where he spearheaded research and development projects that have resulted in multiple successful product launches.

Collaborations: Throughout his career, Seon-Mee Cho has collaborated with top engineers, researchers, and developers in the industry, fostering a culture of innovation and excellence in all his projects.

Conclusion: Seon-Mee Cho's passion for pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and tech enthusiasts worldwide.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…