Yongin, South Korea

Sang-Mun Chon

This inventor holds 28 USPTO granted patents and 1 EPO patent, primarily in Semiconductor Processing. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2000-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sang-Mun Chon. Retrieved from https://idiyas.com/inventor/sang-mun-chon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 67.9


Average Co-Inventor Count = 5.4

ph-index = 5

Forward Citations = 87(Granted Patents)


Location History:

  • Kyonggi-do, KR (2000)
  • Sungnam-shi, KR (2003)
  • Yongin, KR (2005)
  • Kyunggi-do, KR (2004 - 2006)
  • Seongnam, KR (2003 - 2007)
  • Kyeongki-do, KR (2007)
  • Yonging-si, KR (2007 - 2009)
  • Seongnam-si, KR (2005 - 2010)
  • Gyeonggi-do, KR (2007 - 2010)
  • Yongin-Si, KR (2003 - 2011)

Company Filing History:


Years Active: 2000-2011

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Areas of Expertise:
Photoresist Removal
Thin Film Formation
Surface Inspection
Semiconductor Device
Atomic Layer Deposition
Contamination Detection
Polishing Composition
Etching Composition
Capacitor Manufacturing
Wafer Processing
Defect Inspection
Real Time Monitoring
28 patents (USPTO):Explore Patents

Title: Innovations by Sang-Mun Chon: A Leader in Chemical Engineering

Introduction: Sang-Mun Chon, based in Yongin-si, South Korea, is a prominent inventor known for his significant contributions to the field of chemical engineering. With a total of 28 patents to his name, his work primarily focuses on developing advanced compositions and methods that enhance manufacturing processes in the electronics industry. Currently, he is associated with Samsung Electronics Co., Ltd., where his innovative approaches are helping to propel technology forward.

Latest Patents: Sang-Mun Chon has been instrumental in developing several groundbreaking patents, including:

1. **Thinner composition and method of removing photoresist using the same:** This invention features a thinner composition that comprises propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound like ethyl lactate or ethyl 3-ethoxy propionate. This innovative approach offers an effective method for removing photoresist in semiconductor manufacturing.

2. **Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition:** This patent describes an additive composition for a slurry that includes polymeric acid salts. The slurry composition is created by mixing this additive with polishing particles and water, facilitating a chemical mechanical polishing process that achieves favorable polishing selectivity.

Career Highlights: Throughout his career, Sang-Mun Chon has shown a remarkable ability to innovate, focusing on the integration of chemical engineering principles within the electronics sector. His contributions have not only advanced the technology used in semiconductor manufacturing but also provided valuable insights into refining chemical processes.

Collaborations: Sang-Mun has worked alongside talented colleagues, including Yu-sin Yang and Sun-Yong Choi. Together, they have fostered a collaborative environment within Samsung Electronics, driving innovation and efficiency in their projects.

Conclusion: Sang-Mun Chon's contributions to chemical engineering and his inventive spirit exemplify the essence of innovation in the electronics industry. With a notable portfolio of patents and impactful collaborations, he continues to make strides that will shape future technologies and manufacturing practices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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