The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Dec. 06, 2005
Jung-dae Park, Gyeonggi-do, KR;
Sang-eon Lee, Gyeonggi-do, KR;
Sang-mun Chon, Gyeonggi-do, KR;
Yang-koo Lee, Gyeonggi-do, KR;
Dong-chul Heo, Gyeonggi-do, KR;
Pil-kwon Jun, Gyeonggi-do, KR;
Jung-Dae Park, Gyeonggi-do, KR;
Sang-Eon Lee, Gyeonggi-do, KR;
Sang-Mun Chon, Gyeonggi-do, KR;
Yang-Koo Lee, Gyeonggi-do, KR;
Dong-Chul Heo, Gyeonggi-do, KR;
Pil-Kwon Jun, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
Disclosed are a composition for removing photoresist, a method of removing photoresist and a method of manufacturing a semiconductor device using a composition. The composition may include a ketone compound and a first polar aprotic solvent. The composition may also include the ketone compound and a second polar aprotic solvent. Moreover, the composition may include the first polar aprotic solvent and a second polar aprotic solvent with or without the ketone compound. The first polar aprotic solvent has at least one of an ether compound and an ester compound, and the second polar aprotic solvent has at least one of a sulfur-containing compound and a nitrogen-containing compound.