Company Filing History:
Years Active: 2010
Title: The Innovations of Dong-Chul Heo
Introduction
Dong-Chul Heo is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor manufacturing. His work focuses on developing compositions and methods that enhance the efficiency of photoresist removal.
Latest Patents
Dong-Chul Heo holds 1 patent for his invention titled "Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same." This patent discloses a composition that includes a ketone compound and a first polar aprotic solvent. The composition may also incorporate a second polar aprotic solvent. The first polar aprotic solvent consists of at least one ether or ester compound, while the second polar aprotic solvent contains at least one sulfur or nitrogen-containing compound. This innovative approach aims to improve the semiconductor manufacturing process.
Career Highlights
He is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the methods used in the industry.
Collaborations
Dong-Chul Heo has collaborated with notable colleagues such as Jung-Dae Park and Sang-Eon Lee. Their combined expertise contributes to the innovative projects at Samsung Electronics.
Conclusion
Dong-Chul Heo's contributions to semiconductor technology through his patent and work at Samsung Electronics highlight his role as a key innovator in the field. His advancements in photoresist removal methods are paving the way for more efficient semiconductor manufacturing processes.