The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2007
Filed:
Jun. 23, 2003
Gi-jung Kim, Kyeonkgi-do, KR;
Woo-serk Kim, Kyeongki-do, KR;
Sang-mun Chon, Kyeongki-do, KR;
Tae-yeol Heo, Kyeongki-do, KR;
Gi-Jung Kim, Kyeonkgi-do, KR;
Woo-Serk Kim, Kyeongki-do, KR;
Sang-Mun Chon, Kyeongki-do, KR;
Tae-Yeol Heo, Kyeongki-do, KR;
Abstract
Semiconductor wafers utilize asymmetric edge profiles (EP) to facilitate higher yield semiconductor device processing. These edge profiles are configured to reduce the volume of thin film residues that may form on a top surface of a semiconductor wafer at locations adjacent a peripheral edge thereof. These edges profiles are also configured to inhibit redeposition of residue particulates on the top surfaces of the wafers during semiconductor processing steps. Such steps may include surface cleaning and rinsing steps that may include passing a cleaning or rinsing solution across a wafer or batch of wafers that are held by a cartridge and submerged in the solution.