The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Jul. 30, 2004
Joung-soo Kim, Gyeonggi-do, KR;
Yu-sin Yang, Seoul, KR;
Moon-kyung Kim, Gyeonggi-do, KR;
Sang-mun Chon, Gyeonggi-do, KR;
Sun-yong Choi, Gyeonggi-do, KR;
Chung-sam Jun, Gyeonggi-do, KR;
Joung-Soo Kim, Gyeonggi-do, KR;
Yu-Sin Yang, Seoul, KR;
Moon-Kyung Kim, Gyeonggi-do, KR;
Sang-Mun Chon, Gyeonggi-do, KR;
Sun-Yong Choi, Gyeonggi-do, KR;
Chung-Sam Jun, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
In a method for inspecting a defect in accordance with one aspect of the present invention, an object is divided into a plurality of regions. Reflectivity of each of the plurality of regions is obtained. Amplification ratio for each region is determined using the reflectivity. A light is irradiated onto the regions. A light reflected from a first region is amplified by a first amplification ratio that is determined for the first region. Moving the irradiated light from the first region to a second region is detected. A light reflected from the second region is amplified by a second amplification ratio that is determined for the second region. The amplified lights from the first region and the second region are analyzed to determine an existence of a defect on the object.