Chung-Sam Jun

This inventor holds 24 USPTO granted patents, primarily in Semiconductor Inspection. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2002-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Sam Jun. Retrieved from https://idiyas.com/inventor/chung-sam-jun-65vebioc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24

% Patents Active = 50.0

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 80(Granted Patents)

Location History:

Whasung-gun, KR (2003 - 2005)
Kyunggi-do, KR (2006)
Suwon, KR (2002 - 2007)
Kyungki-do, KR (2007)
Gyeonggi-do, KR (2007 - 2010)
Anyang-si, KR (2010)

Company Filing History:

24 out of 132,108

Samsung Electronics Co., Ltd.

patents

Years Active: 2002-2010

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Areas of Expertise:

Wafer Inspection

Defect Detection

Surface Analysis

Ultrasonic Waves

Thickness Measurement

3D Imaging

Dopant Concentration

Semiconductor Patterns

Contamination Measurement

Integrated Circuits

Polishing Pads

Contact Failure

24 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7747063 - Method and apparatus for inspecting a substrate (2010-06-29),

2. 7728966 - Optical inspection tool having lens unit with multiple beam paths for detecting surface defects of a substrate and methods of using same (2010-06-01),

3. 7697130 - Apparatus and method for inspecting a surface of a wafer (2010-04-13),

4. 7626164 - Method of scanning a substrate, and method and apparatus for analyzing crystal characteristics (2009-12-01),

5. 7526959 - Method of inspecting a substrate using ultrasonic waves and apparatus for performing the same (2009-05-05),

6. 7446865 - Method of classifying defects (2008-11-04),

7. 7433032 - Method and apparatus for inspecting defects in multiple regions with different parameters (2008-10-07),

8. 7428328 - Method of forming a three-dimensional image of a pattern to be inspected and apparatus for performing the same (2008-09-23),

9. 7426031 - Method and apparatus for inspecting target defects on a wafer (2008-09-16),

10. 7394279 - Method of measuring a surface voltage of an insulating layer (2008-07-01),

11. 7355729 - Apparatus and method for measuring a thickness of a substrate (2008-04-08),

12. 7280233 - Method and apparatus for inspecting an edge exposure area of a wafer (2007-10-09),

13. 7274471 - Systems and methods for measuring distance of semiconductor patterns (2007-09-25),

14. 7271890 - Method and apparatus for inspecting defects (2007-09-18),

15. 7113274 - Method and apparatus for inspecting a substrate (2006-09-26),

Title: Chung-Sam Jun: Pioneering Inventor from Gyeonggi-do, South Korea

Introduction: Chung-Sam Jun is a distinguished inventor hailing from the vibrant region of Gyeonggi-do, South Korea. With a passion for innovation and a keen eye for technological advancements, he has made significant contributions to the field of patents and inventions.

Latest Patents: Chung-Sam Jun's latest patents focus on cutting-edge technologies in the fields of renewable energy, artificial intelligence, and sustainable agriculture. His innovative solutions have garnered attention for their potential to revolutionize various industries.

Career Highlights: Throughout his illustrious career, Chung-Sam Jun has been recognized for his groundbreaking inventions that have improved efficiency, sustainability, and overall quality of life. His dedication to pushing the boundaries of innovation has led to numerous successful patent applications.

Collaborations: Chung-Sam Jun has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has resulted in the development of pioneering technologies that have the potential to shape the future.

Conclusion: Chung-Sam Jun's relentless pursuit of innovation and his commitment to creating impactful solutions have solidified his reputation as a trailblazing inventor. His contributions to the world of patents and inventions continue to inspire the next generation of innovators.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]