The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2007

Filed:

Dec. 13, 2004
Applicants:

Koung-su Shin, Kyungki-do, KR;

Kwang-jun Yoon, Kyungki-do, KR;

Sun-yong Choi, Kyungki-do, JP;

Chung-sam Jun, Kyungki-do, KR;

Dong-jin Park, Kyungki-do, KR;

Inventors:

Koung-Su Shin, Kyungki-do, KR;

Kwang-Jun Yoon, Kyungki-do, KR;

Sun-Yong Choi, Kyungki-do, JP;

Chung-Sam Jun, Kyungki-do, KR;

Dong-Jin Park, Kyungki-do, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method of measuring a distance of semiconductor patterns is provided. The system includes a microscope and a control unit. The control unit calculates standard coordinates of standard points in view-fields that include spots, spot coordinates of spots with respect to standard points, real coordinates of spots from both of the standard coordinates and spot coordinates, and finally the distance between the two spots from the first and second real coordinates. Coordinates are determined using high magnification, in conjunction with pixel counting, allowing more precise distance measurements.


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