Osaka, Japan

Ryou Kato

USPTO Granted Patents = 25 

 

Average Co-Inventor Count = 3.9

ph-index = 3

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 2012-2021

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25 patents (USPTO):Explore Patents

Title: Ryou Kato: Innovator in Semiconductor Technology

Introduction

Ryou Kato is a recognized inventor based in Osaka, Japan, known for his significant contributions to the field of semiconductor technology. With an impressive portfolio of 25 patents, Kato has been at the forefront of innovation in this critical area, enhancing the efficiency and functionality of semiconductor devices.

Latest Patents

Among his latest patents, Kato developed a semiconductor device featuring a unique N-type semiconductor substrate composed of silicon. This innovation includes an N-type low-concentration impurity layer, a metal layer with a thickness of at least 20 micrometers, and vertical MOS transistors integrated efficiently within the low-concentration impurity layer. His approach emphasizes the ratio of the metal layer thickness to the semiconductor layers, ensuring superior performance in electronic applications.

Another noteworthy invention consists of a semiconductor that integrates a metal layer comprising silver and nickel, designed to encompass transistors with a specific configuration of electrodes. This patent defines the parameters for the dimensions of the semiconductor layer and the source electrode, demonstrating Kato's attention to detail in optimizing semiconductor device functionality.

Career Highlights

Throughout his career, Ryou Kato has worked with prestigious companies, including Panasonic Corporation and Panasonic Intellectual Property Management Co., Ltd. His role in these organizations allowed him to further his research and innovation in semiconductor technology, contributing to the development of cutting-edge electronic components.

Collaborations

Kato's collaborative efforts have involved prominent colleagues such as Toshiya Yokogawa and Atsushi Yamada. Their teamwork and shared expertise in semiconductor advancements have propelled vital projects, resulting in patents that enhance technological capabilities.

Conclusion

Ryou Kato exemplifies excellence in the field of semiconductor innovation. With a remarkable collection of patents and collaborations with industry leaders, his contributions continue to shape the landscape of technology. As he pushes the boundaries of semiconductor science, Kato stands as an inspiring figure within the research and development community.

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