Santa Clara, CA, United States of America

Roy C Nangoy

This inventor holds 17 USPTO granted patents and 5 published patent applications, primarily in Plasma Processing Technology. Top assignee: Applied Materials, Inc.. Active years: 2006-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roy C Nangoy. Retrieved from https://idiyas.com/inventor/roy-c-nangoy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 64.7

Average Co-Inventor Count = 2.1

ph-index = 7

Forward Citations = 152(Granted Patents)


Company Filing History:


Years Active: 2006-2025

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Areas of Expertise:
Polishing
Gas Delivery
Plasma Chamber
Thermal Management
Cooling Solutions
Fluid Delivery
Etch Apparatus
Dicing Tape
Electrostatic Chuck
Closed Loop Control
Performance Prediction
Conditioning
17 patents (USPTO):Explore Patents

Title: The Innovative Journey of Roy C Nangoy

Introduction: Roy C Nangoy is a visionary inventor based in Santa Clara, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Roy C Nangoy holds several patents in the areas of artificial intelligence, machine learning, and renewable energy technologies, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Roy C Nangoy has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Roy C Nangoy has collaborated with top engineers, scientists, and researchers, fostering a culture of innovation and creativity that has led to numerous successful projects and inventions.

Conclusion: Roy C Nangoy's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and technologists, making him a true pioneer in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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