The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Mar. 08, 2013
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Roy C. Nangoy, Santa Clara, CA (US);

Andrew Nguyen, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05B 1/18 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01); B01F 15/02 (2006.01);
U.S. Cl.
CPC ...
B05B 1/185 (2013.01); B01F 15/0264 (2013.01); C23C 16/45563 (2013.01); C23C 16/45565 (2013.01); C23C 16/45578 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32119 (2013.01); H01L 21/67069 (2013.01);
Abstract

Embodiments of the present invention relate to method and apparatus for providing processing gases to a process chamber with improved uniformity. One embodiment of the present invention provides a gas injection assembly. The gas injection assembly includes an inlet hub, a nozzle having a plurality of injection passages disposed against the inlet hub, and a distribution insert disposed between the nozzle and the inlet hub. The distribution insert has one or more gas distribution passages configured to connect the inlet hub to the plurality of the injection passages the nozzle. Each of the one or more gas distribution passages has one inlet connecting with a plurality of outlets, and distances between the inlet and each of the plurality of outlets are substantially equal.


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