The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2022

Filed:

Oct. 29, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Roy C. Nangoy, Santa Clara, CA (US);

Chad Pollard, San Jose, CA (US);

Allen L. D'Ambra, Burlingame, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); B24B 57/02 (2006.01); B67D 7/12 (2010.01); B67D 7/42 (2010.01); G01F 1/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); B24B 57/02 (2013.01); B67D 7/12 (2013.01); B67D 7/42 (2013.01); G01F 1/206 (2013.01);
Abstract

Embodiments of the present disclosure provide for apparatus used to detect clogs in a fluid delivery system during CMP processes and methods of detecting clogs in a fluid delivery system during CMP processes. In particular, embodiments herein provide a flow splitter manifold configured to enable monitoring of the pressure of the polishing fluid disposed therein. Monitoring the fluid pressure in the flow splitter manifold enables the detection of clogs in the delivery lines and/or dispense nozzles that inhibit and/or prevent the flow of polishing fluid therethrough or therefrom.


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