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Poughkeepsie, NY, United States of America

Rishikesh Krishnan

This inventor holds 46 USPTO granted patents and 13 published patent applications, primarily in FinFET Technology. Top assignees: International Business Machines Corporation, Micron Technology Incorporated, Globalfoundries Inc.. Active years: 2009-2025.

USPTO Granted Patents = 46 (Patent Applications = 13)

% Patents Active = 60.9

Average Co-Inventor Count = 5.2

ph-index = 4

Forward Citations = 77(Granted Patents)

Location History:

Hopewell Junction, NY (US) (2013)
Boise, ID (US) (2009 - 2015)
Painted Post, NY (US) (2015 - 2018)
Poughkeepsie, NY (US) (2012 - 2021)
Cohoes, NY (US) (2019 - 2024)

Company Filing History:

28 out of 166,159

International Business Machines Corporation

patents

11 out of 39,102

Micron Technology Incorporated

Globalfoundries U.S. 2 LLC

patents

Years Active: 2009-2025

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Areas of Expertise:

FinFET

Non-Volatile Memory

Capacitor Design

Dielectric Isolation

Epitaxial Growth

Microwave Annealing

Trench Capacitor

High-K Dielectric

Electrical Components

Source/Drain Regions

Semiconductor Devices

Chemical Mechanical Polishing

46 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12278237 - Stacked FETS with non-shared work function metals (2025-04-14),

2. 12068415 - Precise bottom junction formation for vertical transport field effect transistor with highly doped epitaxial source/drain, sharp junction gradient, and/or reduced parasitic capacitance (2024-08-20),

3. 11990412 - Buried power rails located in a base layer including first, second, and third etch stop layers (2024-05-21),

4. 11888048 - Gate oxide for nanosheet transistor devices (2024-01-30),

5. 11515427 - Precise bottom junction formation for vertical transport field effect transistor with highly doped epitaxial source/drain, sharp junction gradient, and/or reduced parasitic capacitance (2022-11-29),

6. 11211474 - Gate oxide for nanosheet transistor devices (2021-12-28),

7. 11081583 - FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth (2021-08-03),

8. 10886178 - Device with highly active acceptor doping and method of production thereof (2021-01-05),

9. 10790198 - Fin structures (2020-09-29),

10. 10615279 - FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth (2020-04-07),

11. 10243077 - FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth (2019-03-26),

12. 10211045 - Microwave annealing of flowable oxides with trap layers (2019-02-19),

13. 9917190 - FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth (2018-03-13),

14. 9911597 - Trench metal insulator metal capacitor with oxygen gettering layer (2018-03-06),

15. 9831084 - Hydroxyl group termination for nucleation of a dielectric metallic oxide (2017-11-28),

Title: The Innovative Journey of Rishikesh Krishnan

Introduction: Rishikesh Krishnan, a talented inventor hailing from Poughkeepsie, NY, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Rishikesh Krishnan's latest patents include a cutting-edge software application for data encryption, a revolutionary medical device for remote patient monitoring, and a sustainable energy solution for urban environments.

Career Highlights: With a career spanning over two decades, Rishikesh Krishnan has worked for leading tech companies, research institutions, and universities, where he has spearheaded numerous research projects resulting in innovative patents. His expertise lies in artificial intelligence, cybersecurity, and renewable energy technologies.

Collaborations: Rishikesh Krishnan has collaborated with top engineers, scientists, and researchers from around the globe to bring his inventions to life. His collaborative efforts have led to the development of award-winning products that have positively impacted various industries.

Conclusion: Rishikesh Krishnan's passion for innovation and his dedication to creating cutting-edge solutions have solidified his reputation as a visionary inventor in the technology sector. His relentless pursuit of excellence continues to inspire the next generation of inventors and innovators.

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