Boise, ID, United States of America

Richard H Lane

USPTO Granted Patents = 88 

 

Average Co-Inventor Count = 2.1

ph-index = 14

Forward Citations = 612(Granted Patents)

Forward Citations (Not Self Cited) = 569(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:


Years Active: 1998-2015

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Areas of Expertise:
Electrical Isolation
Semiconductor Structures
Integrated Circuit Formation
Self-Aligned Trench Formation
Electropolishing Techniques
Metal Silicide Transistor Gates
Capacitor Constructions
Ion Implantation Methods
Field Emission Devices
High-Pressure Anneal Processes
Transistor Gate Structures
Memory Cell Interconnects
88 patents (USPTO):Explore Patents

Title: Innovations by Richard H. Lane in Semiconductor Technologies

Introduction

Richard H. Lane is a prominent inventor based in Boise, ID, known for his significant contributions to semiconductor technologies. With an impressive portfolio of 88 patents, Lane has pushed the boundaries of innovation in the semiconductor industry, particularly in methods of electrical isolation and the development of advanced semiconductor structures.

Latest Patents

Two of Richard H. Lane's latest patents demonstrate his expertise in semiconductor technologies. The first patent, titled "Methods of providing electrical isolation and semiconductor structures including same," focuses on techniques for isolating gates within a semiconductor structure. This innovation utilizes spacer material in combination with fins to enhance device performance. Moreover, it capitalizes on the etch characteristics of various materials during fabrication to increase an effective gate length and a field gate oxide, ultimately leading to improved semiconductor structures.

The second patent, "Self-aligned semiconductor trench structures," outlines methods for forming self-aligned trenches that aid in device integration. In this invention, a first set of trenches is utilized to align a second set, allowing for a pitch doubling technique. This method offers advancements in device fabrication, particularly through the employment of a very thin chemical mechanical polishing (CMP) stop layer, which leads to improved planarity at the device surface.

Career Highlights

Throughout his career, Richard H. Lane has been associated with several notable companies, including Micron Technology Incorporated and Micron Communications, Inc. His work in these organizations has greatly contributed to the advancement of semiconductor technologies, solidifying his reputation as a leading inventor in the field.

Collaborations

Richard has collaborated with esteemed professionals in the industry, including John K. Zahurak and Charles H. Dennison. These collaborations have fostered a rich environment of innovation and have led to the successful development of groundbreaking semiconductor technologies.

Conclusion

Richard H. Lane's extensive patent portfolio and innovative spirit mark him as a significant figure in the semiconductor industry. His recent patents continue to pave the way for advancements in electrical isolation and trench structures, making a lasting impact on the future of semiconductor technologies.

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