The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Nov. 06, 2009
Applicant:
Richard H. Lane, Boise, ID (US);
Inventor:
Richard H. Lane, Boise, ID (US);
Assignee:
Round Rock Research, LLC, Mt. Kisco, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); H01L 21/8242 (2006.01); H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
An electropolishing process for high resolution patterning of noble metals, such as platinum, for forming various semiconductor devices, such as capacitors or wiring patterns is disclosed.
Lane, Richard. (2011). Method of patterning noble metals for semiconductor devices by electropolishing (U.S. Patent No. 7943477). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7943477
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile