Tittmoning, Germany

Reinhold Wahlich

This inventor holds 20 USPTO granted patents and 2 EPO patents, primarily in Semiconductor Manufacturing. Top assignees: Siltronic Ag, Wacker Siltronic Gesellschaft Fur Halbleitermaterialien Ag. Active years: 1999-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Reinhold Wahlich. Retrieved from https://idiyas.com/inventor/reinhold-wahlich

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0


Average Co-Inventor Count = 3.8

ph-index = 6

Forward Citations = 126(Granted Patents)


Company Filing History:


Years Active: 1999-2013

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Areas of Expertise:
Multilayered Wafer
SOI Technology
Silicon Wafer
Semiconductor Substrate
Heat Treatment
Wafer Thickness
Crystal Lattice Defects
Defect Reduction
Layered Semiconductor
Manufacturing Process
20 patents (USPTO):Explore Patents

Title: Innovations in Semiconductor Technology: The Contributions of Reinhold Wahlich

Introduction

Reinhold Wahlich, a prominent inventor based in Tittmoning, Germany, has made significant strides in semiconductor technology, accumulating an impressive portfolio of 20 patents. His inventions focus primarily on the production and enhancement of semiconductor wafers, which are crucial in the advancement of electronic devices.

Latest Patents

Among his latest innovations, two patents stand out for their technical ingenuity. The first patent, titled "Multilayered Semiconductor Wafer and Process for Manufacturing the Same," involves a sophisticated method for preparing silicon carbide substrate wafers. This process incorporates transferring a monocrystalline silicon layer from a donor wafer onto a handle wafer, followed by the implantation of carbon and annealing, ultimately forming a monocrystalline SiC layer.

The second notable patent, "SOI Wafer and Method for Producing It," delineates the construction of a Silicon-On-Insulator (SOI) wafer from a carrier wafer and a monocrystalline silicon layer less than 500 nm thick. The innovative process involves Czochralski silicon single crystal growth, ensuring an excess of interstitial silicon atoms throughout the silicon layer. By carefully managing the crystallization front conditions, Wahlich’s method produces high-quality SOI wafers, vital for modern electronic applications.

Career Highlights

Reinhold Wahlich has held key positions at prestigious companies within the semiconductor industry, including Siltronic AG and Wacker Siltronic Gesellschaft für Halbleitermaterialien AG. His work has contributed to the development of cutting-edge technologies that enhance the performance and efficiency of semiconductor devices.

Collaborations

Throughout his career, Wahlich has collaborated with esteemed colleagues, including Brian Murphy and Andreas Huber. These partnerships have fostered an environment of innovation, leading to the successful development of various semiconductor solutions that push the boundaries of technology.

Conclusion

Reinhold Wahlich's impactful contributions to semiconductor technology exemplify the vital role of inventors in shaping the future of electronics. His patents, particularly in wafer production, reflect a blend of creativity and scientific rigor, signifying important advancements that continue to influence the industry. As technology evolves, Wahlich’s legacy in innovation will undoubtedly leave a lasting mark on the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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