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For the Inventor, By the Inventor

North Andover, MA, United States of America

Ravi Kanjolia

This inventor holds 13 USPTO granted patents and 1 published patent application and 7 EPO patents. Top assignees: Sigma-Aldrich Co. LLC, Merck Patent Gmbh, Applied Materials, Inc.. Active years: 2012-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ravi Kanjolia. Retrieved from https://idiyas.com/inventor/ravi-kanjolia

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13 

% Patents Active = 84.6

 

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 38(Granted Patents)


Location History:

  • North Andover, MA (US) (2012 - 2019)
  • Somerville, NJ (US) (2020 - 2022)

Company Filing History:

goldMedal7 out of 142 
 
Sigma-Aldrich Co. LLC
 patents
silverMedal5 out of 3,025 
 
Merck Patent Gmbh
 patents
bronzeMedal1 out of 14,482 
 
Applied Materials, Inc.
 patents

Years Active: 2012-2025

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13 patents (USPTO):Explore Patents
1. 12286449 - Metal complexes containing cyclopentadienyl ligands (2025-04-29),
2. 11312730 - Metal complexes containing cyclopentadienyl ligands (2022-04-26),
3. 10723749 - Metal complexes containing allyl ligands (2020-07-28),
4. 10364492 - Film deposition using precursors containing amidoimine ligands (2019-07-30),
5. 10221481 - Metal complexes containing amidoimine ligands (2019-03-05),
6. 10155783 - Manganese complexes and use thereof for preparing thin films (2018-12-18),
7. 9297071 - Solid precursor delivery assemblies and related methods (2016-03-29),
8. 9175023 - Molybdenum allyl complexes and use thereof in thin film deposition (2015-11-03),
9. 9028917 - High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films (2015-05-12),
10. 8927748 - Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films (2015-01-06),
11. 8481121 - Methods of forming thin metal-containing films by chemical phase deposition (2013-07-09),
12. 8476467 - Organometallic precursors for use in chemical phase deposition processes (2013-07-02),
13. 8272626 - Bubbler for the transportation of substances by a carrier gas (2012-09-25),

Title: The Innovative Journey of Ravi Kanjolia

Introduction

Ravi Kanjolia is a prominent inventor based in North Andover, MA (US). He has made significant contributions to the field of materials science, particularly in the development of metal complexes. With a total of 13 patents to his name, Kanjolia's work has had a substantial impact on various applications in technology and manufacturing.

Latest Patents

Among his latest patents, Kanjolia has developed innovative metal complexes containing cyclopentadienyl ligands. These patents detail methods of using such metal complexes to prepare metal-containing films, showcasing his expertise in the synthesis and application of advanced materials. His work in this area is crucial for industries that rely on high-performance materials.

Career Highlights

Throughout his career, Kanjolia has worked with notable companies such as Sigma-Aldrich Co. LLC and Merck Patent GmbH. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking research and development projects. His dedication to innovation is evident in the patents he has secured.

Collaborations

Kanjolia has collaborated with talented individuals in his field, including Rajesh Odedra and Neil Boag. These partnerships have fostered a creative environment that encourages the exchange of ideas and the advancement of technology.

Conclusion

Ravi Kanjolia's contributions to the field of materials science through his patents and collaborations highlight his role as a leading inventor. His work continues to influence the development of advanced materials and technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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