The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Jul. 24, 2008
Applicants:
Ravi Kanjolia, North Andover, MA (US);
Rajesh Odedra, Altrincham, GB;
Neil Boag, Mytholmroyd, GB;
Inventors:
Assignee:
Sigma-Aldrich Co. LLC, St. Louis, MO (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07F 17/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
An organometallic precursor is provided. The precursor corresponds in structure to Formula I:Cp(R)M(CO)(X)  (Formula I)wherein: M is Ru, Fe or Os; R is C-C-alkyl; X is C-C-alkyl; and n is 1, 2, 3, 4 or 5. The precursors are useful in chemical phase deposition processes, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD).